| 亚半微米投影光刻物镜的研究设计 |
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| 引用本文： | 陈旭南,姚汉民,李展,林妩媚,余国彬,罗先刚. 亚半微米投影光刻物镜的研究设计[J]. 微细加工技术, 2000, 0(1): 26-30 |
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| 作者姓名： | 陈旭南 姚汉民 李展 林妩媚 余国彬 罗先刚 |
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| 作者单位： | 中国科学光电技术研究所微细加工光学技术国家重点实验室,成都610209 |
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| 摘 要： | 介绍了分步重复投影光刻业半微米光刻物镜光学和机械结构研究设计、设计结果，以及公差控制。指出技术指标已达到：数值孔径ＮＡ＝０．６３、工作波长λ＝３６５ｎｍ、倍率５ｘ、工作分辨力Ｒ≤０．３５μｍ，设计和镜所用透镜片数最少，无胶合件，并具有暗场同轴对准和温度气压控制补偿功能。
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| 关 键 词： | 亚半微米光刻 投影物镜 设计 集成电路 |
| 文章编号： | 1003-8213(2000)01-0005-05 |
| 修稿时间： | 1999-04-09 |
Design of project lens used in sub-half micron lihography |
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| CHEN Xu-nan,YAO Han-min,LI Zhan,LIN Wu-mei,YU Guo-bin,LUO Xian-gang. Design of project lens used in sub-half micron lihography[J]. Microfabrication Technology, 2000, 0(1): 26-30 |
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| Authors: | CHEN Xu-nan YAO Han-min LI Zhan LIN Wu-mei YU Guo-bin LUO Xian-gang |
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| Affiliation: | CHEN Xu-nan,YAO Han-min,LI Zhan,LIN Wu-mei,YU Guo-bin,LUO Xian-gang;(State Key Lab of Optical Technology on Microfabrication, Institute of Optics and electrons, Academia Sinica. Chengdu 610209, China) |
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| Abstract: | The optical and mechanical structures of the object lens used in sub-half micron lithography are described. The design results and tolerance control are also shown. The technical data are as follows, numerical aperture is 0.63, work wavelength is 365nm, ratio is 5X and work resolution is 0.35 micron. The object lens has the functions of dark field TTL alignment and compensation of temperature and air pressure control. |
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| Keywords: | Sub-half micron lithography Projection object lens |
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