| 用于LCD的氧化铝阻挡层的射频反应溅射沉积及其特性 |
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| 引用本文： | 茅昕辉,张浩康.用于LCD的氧化铝阻挡层的射频反应溅射沉积及其特性[J].光电子技术,1998,18(2):134-137. |
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| 作者姓名： | 茅昕辉 张浩康 |
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| 作者单位： | 东南大学薄膜研究所!南京210096 |
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| 摘 要： | 用金属铝靶射频反应溅射制备了Ａｌ２Ｏ３薄膜，用作ＬＣＤ基片玻璃的钠离子阻挡层。报道了射频溅射参数对薄膜沉积速率和折射率的影响。测试结果表明，所沉积的Ａｌ２Ｏ３薄膜满足ＬＣＤ器件阻挡层的要求。
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| 关 键 词： | 射频溅射 反应溅射 LCD 阻挡层 液晶显示器件 |
Preparation and Properties of Al_2O_3 Barrier Layers for LCD by RF Reactive Sputtering |
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| Mao Xlnhui, Zhang Haokang, Chen Guoping.Preparation and Properties of Al_2O_3 Barrier Layers for LCD by RF Reactive Sputtering[J].Optoelectronic Technology,1998,18(2):134-137. |
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| Authors: | Mao Xlnhui Zhang Haokang Chen Guoping |
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| Abstract: | Al2O3 thin films used for LCD barrier layers were prepared by RF sputter ing with Al target. The effects of the process parameters to the deposition rate and refrac tive index of Al,O, films were reported- The properties of Al,O, films used for barrier lay ers were tested. It was showed that the deposited films meet the needs for LCD |
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| Keywords: | Al_2O_3 film RF sputtering reactive sputtering LCD barrier layers |
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