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真丝绸氧化还原体系低温染色
引用本文:罗臣涛. 真丝绸氧化还原体系低温染色[J]. 浙江理工大学学报, 1990, 0(2)
作者姓名:罗臣涛
作者单位:浙江省纺织工业学校染化系 79届毕业生
摘    要:本文讨论了氧化还原体系在真丝绸低温染色中的作用机理,并对影响染色的若干因素(氧化还原体系的不同配比及浓度、温度、时间、pH 值、助剂,染料特性及浓度等)进行了探讨,结果表明,其染色质量优于常规沸温工艺。

关 键 词:氧化还原体系  真丝织物  低温染色

Real Silk Fabric Low-temperature Dyeing With Redox System
Luo Jutao. Real Silk Fabric Low-temperature Dyeing With Redox System[J]. Journal of Zhejiang Sci-tech University, 1990, 0(2)
Authors:Luo Jutao
Affiliation:Zhejiang Textile Industry School
Abstract:The low-temperature dyeing mechanism of real silk fabric with redox system is investigated,emphasizing on the factors that affect the dyeability, such as concentration of redox system,temperature and time of dyeing,pH value,auxiliaries,concentration and nature of the dyes.It is concluded the results of dyeing with redox system is better than those with other techniques so far adopted.
Keywords:Redox System  Real Silk Fabric  Low-temperature Dyeing
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