Effect of interfacial segregation on phase decomposition of a thin film on a patterned substrate |
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Authors: | Email author" target="_blank">William?C?JohnsonEmail author S?M?Wise J?Y?Huh J?Favergeon |
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Affiliation: | (1) Department of Materials Science and Engineering, University of Virginia, 116 Engineer’s Way, P.O. Box 400745, 22904-4745 Charlottesville, VA, USA;(2) Division of Materials Science and Engineering, Korea University, 1 Anam-dong 5-ga, Seongbuk-gu, 136-701 Seoul, Korea |
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Abstract: | Numerical simulations of phase decomposition in thin films on patterned substrates are presented for a binary alloy in order
to study the influence of substrate composition on microstructural evolution. For systems with a substrate composition less
than the film composition, a preferential segregation ofA to the interface was observed and no phase decomposition occurred within the film. For patterned systems with a substrate
composition exceeding the film composition, theB-rich phase was able to grow by a barrierless transformation for a range of film compositions outside the chemical spinodal.
The number of precipitates which formed on the mesa, the dihedral angles at the three-phase trijunctions, and the resulting
microstructure within the film were shown to be sensitive to the substrate composition.
This article is based on a presentation made in the 2002 Korea-US symposium on the “Phase Transformations of Nano-Materials,”
organized as a special program of the 2002 Annual Meeting of the Korean Institute of Metals and Materials, held at Yonsel
University, Seoul, Korea on October 25–26, 2002. |
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Keywords: | thin film patterned substrate phase decomposition segregation wetting |
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