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Efficiency (>15%) for thin‐film epitaxial silicon solar cells on 70 cm2 area offspec silicon substrate using porous silicon segmented mirrors
Authors:I. Kuzma‐Filipek  K.V. Nieuwenhuysen  J.V. Hoeymissen  M.R. Payo  E.V. Kerschaver  J. Poortmans  R. Mertens  G. Beaucarne  E. Schmich  S. Lindekugel  S. Reber
Abstract:We report on the beneficial use of embedded segmented porous silicon broad‐band optical reflectors for thin‐film epitaxial silicon solar cells. These reflectors are formed by gradual increase of the spatial period between the layer segments, allowing for an enhanced absorption of low energy photons in the epitaxial layer. By combining these reflectors with well‐established solar cell processing by photolithography, a conversion efficiency of 15·2% was reached on 73 cm2 area, highly doped offspec multicrystalline silicon substrates. The corresponding photogenerated current densities (Jsc) were well above 31 mA/cm2 for an active layer of only 20 µm. Copyright © 2010 John Wiley & Sons, Ltd.
Keywords:chirped porous silicon reflectors  segmented chirping  Bragg reflector  photolithography  epitaxy  thin‐film Si solar cells
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