| 超导Nb膜表面减反膜技术研究 |
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| 引用本文： | 钟青,刘文德,马晓欢,王君,郑春弟,王雪深,李劲劲.超导Nb膜表面减反膜技术研究[J].计量学报,2019,40(1):78-81. |
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| 作者姓名： | 钟青 刘文德 马晓欢 王君 郑春弟 王雪深 李劲劲 |
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| 作者单位： | 中国计量科学研究院,北京,100029;北京信息科技大学仪器科学与光电工程学院,北京,100192 |
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| 基金项目： | 国家重点研发计划(2017YFF0206105);国家自然科学基金(61701470);北京信息科技大学2017-2018年度“实培计划” |
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| 摘 要： | 针对单光子探测芯片中超导Nb膜减反的问题,研究了磁控溅射Nb膜折射率光谱特性随Nb膜厚度变化的规律,同时研究了化学气相沉积法制备的SiO2和SiNx介质膜的折射率光谱特性。为降低超导Nb膜对633 nm光的反射比,在Nb膜表面设计和制备了SiO2和SiNx减反膜。测试结果表明:SiO2和SiNx使反射比明显减小,计算结果验证了这一趋势。
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| 关 键 词： | 计量学 减反膜 超导Nb膜 介质膜 单光子探测芯片 |
| 收稿时间： | 2018-05-16 |
Study on Antireflective Layer above Superconducting Nb Films |
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| ZHONG Qing,LIU Wen-de,MA Xiao-huan,WANG Jun,ZHENG Chun-di,WANG Xue-shen,LI Jin-jin.Study on Antireflective Layer above Superconducting Nb Films[J].Acta Metrologica Sinica,2019,40(1):78-81. |
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| Authors: | ZHONG Qing LIU Wen-de MA Xiao-huan WANG Jun ZHENG Chun-di WANG Xue-shen LI Jin-jin |
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| Affiliation: | 1.National Institute of Metrology, Beijing 100029, China
2.School of Instrumentation Science and Opto Electronics Engineering, Beijing Information Science and Technology University, Beijing 100192, China |
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| Abstract: | An antireflective layer should be fabricated on the surface of Nb film which was used as the photon energy detection unit in the single photon standard.The spectral refractive index characteristics of Nb films with different thickness made by a magnetron sputter system, SiO2 and SiNx films made by a plasma enhanced chemical vapor deposition system were studied.To reduce the reflection ratio of the superconducting Nb film at 633 nm, the structure of the SiO2/Nb and SiNx/Nb structure were designed and fabricated.The reflectivity was effectively reduced,which was verified by the results of the calculation. |
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| Keywords: | metrology antireflective layer superconducting Nb film dielectric film single photon detection chip |
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