首页 | 本学科首页   官方微博 | 高级检索  
     

2,4-DCP的电化学降解及影响因素研究
引用本文:胡俊生,徐志荣,李春荣,班福忱,谢添.2,4-DCP的电化学降解及影响因素研究[J].沈阳建筑工程学院学报(自然科学版),2007,23(6):1012-1015.
作者姓名:胡俊生  徐志荣  李春荣  班福忱  谢添
作者单位:沈阳建筑大学市政与环境工程学院 辽宁沈阳110168
基金项目:建设部科技攻关项目;沈阳建筑大学校科研和教改项目
摘    要:目的研究2,4-二氯苯酚(2,4-DCP)的电化学氧化降解的效果.方法采用自制电化学反应器对2,4-二氯苯酚(2,4-DCP)模拟废水的电化学氧化处理进行了研究,考察外加电压、支持电解质浓度、初始pH值等影响因素对电解效果的影响,确定电化学氧化降解2,4-二氯酚的较佳条件.结果外加电压为5 V、电解质为Na2CO3,浓度为0.02 mol/L、pH值为3.1、极间距为15 mm、曝气强度0.15 m3/h,2,4-DCP去除率达80%以上;通过曝气加强传质能有效提高降解效率;酸性条件下有利于2,4-DCP的降解;当溶液中含有Cl-、CO32-离子时将有利于2,4-DCP的降解.结论电化学氧化法能够有效降解污水中的2,4-二氯苯酚,降解效果受pH值影响较大,加强曝气传质可有效提高降解效率,较低操作电压和支持电解质浓度,有助于降低处理成本.

关 键 词:2  4-二氯酚  电化学  高级氧化技术  降解
文章编号:1671-2021(2007)06-1012-04
修稿时间:2007-04-10

Degradation of 2, 4-Dichlorophenol by Electrical Chemistry Oxidation
HU Junsheng,XU Zhirong,LI Chunrong,BAN Fuchen,XIE Tian.Degradation of 2, 4-Dichlorophenol by Electrical Chemistry Oxidation[J].Journal of Shenyang Archit Civil Eng Univ: Nat Sci,2007,23(6):1012-1015.
Authors:HU Junsheng  XU Zhirong  LI Chunrong  BAN Fuchen  XIE Tian
Affiliation:Shool of Municipal and Environmental Engineering, Shenyang Jianzhu University, Shenyang China, 110168
Abstract:The aim of this study is to investigate the best way of the degradation of 2,4dichlorophenol using graphite electrodes.Through static experiment,2,4-dichlorophenol solutions were prepared as model environment liquid,and the influence of the concentration of supporting electrolytes,initial 2,4-dichlorophenol concentration and pH were investigated.The results showed that it was better for the degradation of 2,4-dichlorophenol in the acidic condition and through the agency of aerating to change the mass transfer,the efficiency of degradation could be improved.With initial 2,4-dichlorophenol concentration of 100 mg/L,the electric pressure of 5 V,the concentration of supporting electrolytes of 0.02 mol/L,the pH of 3.1 and the interpole gap of 15 mm,the 2,4-dichlorophenol removal rate was the best.The removal of 2,4-dichlorophenol was over 80%.
Keywords:2  4-dichlorophenol  electrical chemistry oxidation  advanced oxidation process  degradation
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号