| 功函数对场致发射稳定性的影响 |
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| 引用本文： | 梁翠果,周清,赵守珍,赵力斌,赵泽发,于宝霞,谢宝森. 功函数对场致发射稳定性的影响[J]. 真空科学与技术学报, 1994, 0(2) |
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| 作者姓名： | 梁翠果 周清 赵守珍 赵力斌 赵泽发 于宝霞 谢宝森 |
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| 作者单位： | 南开大学电子科学系!天津，300071，南开大学电子科学系!天津，300071，南开大学电子科学系!天津，300071，南开大学电子科学系!天津，300071，南开大学电子科学系!天津，300071，南开大学电子科学系!天津，300071，南开大学电子科学系!天津，300071 |
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| 摘 要： | 从理论和实验上研究了材料功函数对场致发射稳定性的影响。研究发现，功函数是决定材料发射稳定性的主要因素。所得数据表明：（1）尖端功函数越稳定，发射电流波动性就越小；（2）尖端的功函数越小，发射的电流也越稳定，强度也越大，所需要的门极电压越低。这一结论在实验研究中充分地得到证实。实验表明，不需要超高真空条件，经过金膜或铯膜覆盖的钽尖端都有稳定的场发射。
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| 关 键 词： | 功函数 场致发射 薄膜 稳定性 |
THE INFLUENCE OF WORK FUNCTION ON THE STABILITY OF FIELD EMISSION |
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| Liang Cuiguo,Zhou Qing, Zhao Shouzhen,Zhao Libin Zhao Zefa,Yu Baoxia,Xie Baosen. THE INFLUENCE OF WORK FUNCTION ON THE STABILITY OF FIELD EMISSION[J]. JOurnal of Vacuum Science and Technology, 1994, 0(2) |
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| Authors: | Liang Cuiguo Zhou Qing Zhao Shouzhen Zhao Libin Zhao Zefa Yu Baoxia Xie Baosen |
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| Abstract: | This paper discusses experimentally and theoretically the influence of work function on the field emission stability for Ta top. It has been shown that the principle influence on the stability of field emission is the work function of material. The results show that the stabler the work function of top material, the smaller the emission current changed. The fact that the smaller the work function value of top material, the stabler and the larger the emission current has been fully confirmed in the experiments. The experimental results show that the Ta tops which are covered by the film of Au or Cs get stable current under the condition of field emission. |
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| Keywords: | Work function Field emission Thin film Stability |
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