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脉冲多弧离子镀制备类金刚石薄膜的结构分析
引用本文:喻志农,朱昌,杭凌侠,严一心,孙鉴.脉冲多弧离子镀制备类金刚石薄膜的结构分析[J].西安工业学院学报,1999,19(4):265-268.
作者姓名:喻志农  朱昌  杭凌侠  严一心  孙鉴
作者单位:西安交通大学电子物理与器件研究所!陕西西安710049(喻志农,孙鉴),西安工业学院(朱昌,杭凌侠,严一心)
摘    要:利用脉冲多弧离子镀技术在硅基底上沉积类金刚石薄膜.喇曼光谱和X 射线衍射分析表明:类金刚石薄膜是无定形结构;利用扫描电镜发现:类金刚石薄膜表面不光滑,石墨颗粒的大小和密度随厚度增加而增加,但薄膜致密.

关 键 词:脉冲多弧离子镀  类金刚石薄膜  结构性能  薄膜形貌
修稿时间:1999-03-04

Structure of diamond-like carbon films prepared by pulse-arc plasma deposition
YU Zhi-nong,ZHU Chang,HANG Ling-xia,YAN Yi-xin,SUN Jian.Structure of diamond-like carbon films prepared by pulse-arc plasma deposition[J].Journal of Xi'an Institute of Technology,1999,19(4):265-268.
Authors:YU Zhi-nong  ZHU Chang  HANG Ling-xia  YAN Yi-xin  SUN Jian
Abstract:Diamond like carbon(DLC) films have been prepared on silicon by pulse arc plasma deposition.The structure of DLC films were investigated by Raman spectrum and X ray diffraction,which show amorphous structure.Scanning Electronical Microscope(SEM) shows that the surface of the films is rough,and the sizes and densities of graphite particles increase with thickness of the film,but the deposited films are dense.
Keywords:pulse  arc plasma deposition  DLC film  structure property  film morphology
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