| 全自动光刻版清洗机工艺原理与工作过程介绍 |
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| 引用本文： | 宋文超,刘永进,王刚,张利军,侯为萍.全自动光刻版清洗机工艺原理与工作过程介绍[J].电子工业专用设备,2014(2):23-27. |
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| 作者姓名： | 宋文超 刘永进 王刚 张利军 侯为萍 |
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| 作者单位： | 中国电子科技集团公司第四十五研究所,北京101601 |
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| 摘 要： | 介绍了常用的光刻版清洗工艺,并详细讲解了全自动光刻版清洗机的工作过程。同时,简单介绍了为提高光刻版清洗效果而设计的浸泡系统、药液供给与循环系统和温控系统。
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| 关 键 词： | 半导体 光刻版清洗 单晶圆清洗 自动设备 |
Introduction to the Process and the Operating of the Automatic Photomask Cleaning Equipment |
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| SONG Wenchao,LIU Yongjin,WANG Gang,ZHANG Lijun,HOU Weiping.Introduction to the Process and the Operating of the Automatic Photomask Cleaning Equipment[J].Equipment for Electronic Products Marufacturing,2014(2):23-27. |
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| Authors: | SONG Wenchao LIU Yongjin WANG Gang ZHANG Lijun HOU Weiping |
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| Affiliation: | (The 45th Research Institute of CETC, Beijing 101601, China) |
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| Abstract: | Photomask cleaning processes are introduced. With one of the processes,the operating of the automatic photomask cleaning equipment is present. The principle of the photomask immersion tank,chemical supply and recycle system,and temperature control system are also introduced. |
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| Keywords: | Semiconductor Photomask cleaning Single wafer clean Automatic equipment |
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