| 浸没式光刻向22nm挺进 |
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| 引用本文： | 马建军,张崇巍.浸没式光刻向22nm挺进[J].电子工业专用设备,2009,38(8):1-8,50. |
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| 作者姓名： | 马建军 张崇巍 |
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| 作者单位： | 1. 长庆实业集团有限公司,陕西,西安,710021
2. 甘肃林业技术学院,甘肃,天水,741020 |
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| 摘 要： | 简述了光学光刻技术在双重图形曝光、高折射率透镜材料及浸没介质、32nm光刻现状及22nm浸没式光刻技术的进展，指出了光学光刻技术的发展趋势及进入22nm技术节点的前景。
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| 关 键 词： | 光学光刻 32 nm光刻 22 nm光刻进展 193 nm浸没式光刻 双重图形光刻 |
193-nm Immersion Lithography with Double-Patterning-Advance to the 22nm |
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| MA Jian-jun,ZHANG Chongwei.193-nm Immersion Lithography with Double-Patterning-Advance to the 22nm[J].Equipment for Electronic Products Marufacturing,2009,38(8):1-8,50. |
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| Authors: | MA Jian-jun ZHANG Chongwei |
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| Affiliation: | MA Jian-jun,ZHANG Chongwei(1.Chang Qing Industry Ltd.Co.,XiAn 710021,China,2.Gansu Forestry Technological College,Tianshui 741020,China) |
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| Abstract: | The optical lithography technology with double patterning,high refractive index lens materials and immersion media,32 nm and 22 nm immersion lithography status of progress in lithography is outlined in this paper,and pointing out that the optical lithography technology trends and access to 22 nm technology nodes outlook. |
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| Keywords: | Optics Lithography 32 nm Lithography 22 nm Lithography Immersion Lithography Dual-patterning Exposure |
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