| 蓝宝石基片的超光滑表面抛光技术 |
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| 引用本文： | 朱从容,任尹飞. 蓝宝石基片的超光滑表面抛光技术[J]. 机械工程师, 2009, 0(11): 16-18 |
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| 作者姓名： | 朱从容 任尹飞 |
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| 作者单位： | [1]浙江海洋学院机电工程学院,浙江舟山316004 [2]弘生集团有限公司,浙江舟山316000 |
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| 摘 要： | 文中介绍了蓝宝石基片的主要抛光方法，包括浮法抛光、机械化学抛光、化学机械抛光和水合抛光等，对它们的工作原理、特点作了分析和总结。
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| 关 键 词： | 蓝宝石 超光滑表面 抛光 |
Ultra-Smooth Surface Polishing Techniques of Sapphire Substrates |
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| Affiliation: | ZHU Cong-rong, REN Yin-fei( 1.College of Mechanical Engineering, Zhejiang Ocean University, Zhoushan 316004, China; 2.Hisun Group Co.,Ltd., Zhoushan 316000, China) |
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| Abstract: | The main polishing technique of sapphire substrates is present in this paper, including float polishing, mechanical chemical polishing, chemical mechanical polishing, hydration polishing and so on. And their polishing mechanism and characteristics were analyzed. |
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| Keywords: | sapphire uhra-smooth surface polishing |
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