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Germination of Phaseolus vulgaris L. Seeds after a Short Treatment with a Powerful RF Plasma
Authors:Nina Recek,Matej Holc,Alenka Vesel,Rok Zaplotnik,Peter Gselman,Miran Mozetič  ,Gregor Primc
Affiliation:1.Jožef Stefan Institute, Jamova cesta 39, 1000 Ljubljana, Slovenia; (M.H.); (A.V.); (R.Z.); (M.M.); (G.P.);2.Interkorn Ltd., Gančani 94, 9231 Beltinci, Slovenia;
Abstract:Seeds of common bean (Phaseolus vulgaris L.), of the Etna variety, were treated with low-pressure oxygen plasma sustained by an inductively coupled radiofrequency discharge in the H-mode for a few seconds. The high-intensity treatment improved seed health in regard to fungal contamination. Additionally, it increased the wettability of the bean seeds by altering surface chemistry, as established by X-ray photoelectron spectroscopy, and increasing surface roughness, as seen with a scanning electron microscope. The water contact angle at the seed surface dropped to immeasurably low values after a second of plasma treatment. Hydrophobic recovery within a month returned those values to no more than half of the original water contact angle, even for beans treated for the shortest time (0.5 s). Increased wettability resulted in accelerated water uptake. The treatment increased the bean radicle length, which is useful for seedling establishment in the field. These findings confirm that even a brief plasma treatment is a useful technique for the disinfection and stimulation of radicle growth. The technique is scalable to large systems due to the short treatment times.
Keywords:plasma   H-mode   bean   seed   water contact angle   water uptake   radicle   germination   fungal contamination
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