XPS studies of poly(acrylic acid) grafted onto UV photo-oxidized polystyrene surfaces |
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| Authors: | A. Khot A. Bailey T. Debies |
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| Affiliation: | 1. Department of Chemistry , Center for Materials Science and Engineering, Rochester Institute of Technology , Rochester , NY , 14623 , USA;2. Xerox Analytical Services, Xerox Corporation , Webster , NY , 14580 , USA |
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| Abstract: | UV photo-oxidation of polystyrene was achieved with 253.7 and 253.7/184.9?nm radiation in the presence of an atmospheric pressure of oxygen and analyzed by X-ray photoelectron spectroscopy as a function of treatment time. A methodical increase in the atomic percentage (at.%) of oxygen occurred during 253.7?nm activation up to 2?h of treatment time. Photo-oxidation with the 253.7/184.9?nm lamps resulted in a saturation level of ca. 35 at.% O. Initially, C–O and C=O groups were formed and then O–C=O type moieties. Poly(acrylic acid) was partially and/or thinly grafted onto the oxidized polystyrene surfaces. |
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| Keywords: | poly(acrylic acid) grafting polystyrene UV photo-oxidation XPS |
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