首页 | 本学科首页   官方微博 | 高级检索  
     


In situ etching for total control over axial and radial nanowire growth
Authors:Magnus T. Borgström  Jesper Wallentin  Johanna Trägårdh  Peter Ramvall  Martin Ek  L. Reine Wallenberg  Lars Samuelson  Knut Deppert
Affiliation:(1) State Key Laboratory of Coal Conversion, Institute of Coal Chemistry, 030001 Taiyuan, People’s Republic of China;(2) Department of Materials Science and Engineering, University of California at Los Angeles, Los Angeles, CA 90095-1595, USA;(3) Graduate University of the Chinese Academy of Sciences, 100039 Beijing, People’s Republic of China;
Abstract:We report a method using in situ etching to decouple the axial from the radial nanowire growth pathway, independent of other growth parameters. Thereby a wide range of growth parameters can be explored to improve the nanowire properties without concern of tapering or excess structural defects formed during radial growth. We demonstrate the method using etching by HCl during InP nanowire growth. The improved crystal quality of etched nanowires is indicated by strongly enhanced photoluminescence as compared to reference nanowires obtained without etching. MediaObjects/12274_2010_1029_Fig1_HTML.jpg
Keywords:
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号