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The effect of annealing on the properties of diamond-like carbon protective antireflection coatings
Authors:Won Seok Choi  Byungyou Hong  
Affiliation:aCenter for Advanced Plasma Surface Technology, Sungkyunkwan University, Suwon 440 746, South Korea;bSchool of Information and Communication Engineering, Sungkyunkwan University, Suwon 440 746, South Korea
Abstract:In addition to its similarity to genuine diamond film, diamond-like carbon (DLC) film has many advantages, including its wide band gap and variable refractive index. Therefore, as one of the diverse applications, DLC film can be utilized as a protective coating for IR windows and an anti-reflective coating for solar cells. For this study, DLC films were prepared by the radio frequency-plasma enhanced chemical vapor deposition (RF-PECVD) method on silicon substrates using methane (CH4) and hydrogen (H2) gas. We examined the effects of the post-annealing temperature and the annealing ambient on structural, electrical and optical properties of DLC films. The films were annealed at temperatures ranging from 300 to 900 °C in steps of 200 °C using rapid thermal annealing equipment in nitrogen ambients. The thickness of the film was observed by scanning electron microscopy (SEM) and surface profile analysis. The variation of structure according to the annealing treatment was examined using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and high-resolution transmission electron microscopy (HRTEM). The reflectance of DLC thin film was investigated by UV–vis spectrometry and its electrical properties were investigated using a four point probe and IV meter. The carrier lifetime of the film was also checked.
Keywords:Plasma enhanced chemical vapor deposition  Diamond-like carbon film  Antireflection coating  Annealing treatment  Electrical properties
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