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聚合物弹性印章的制作工艺
引用本文:唐海林,丁元萍. 聚合物弹性印章的制作工艺[J]. 纳米技术与精密工程, 2008, 6(2): 118-120
作者姓名:唐海林  丁元萍
作者单位:中国工程物理研究院电子工程研究所,绵阳,621900
基金项目:中国工程物理研究院电子工程研究所科研基金
摘    要:为了解决软光亥4技术中核心元件弹性印章的制备技术,对SU-8胶印模和聚合物弹性印章进行了工艺研究.通过多次实验和测量,获得了制作SU-8胶印模和聚合物弹性印章的稳定工艺参数,得到了表面形貌好、线条控制精确的SU-8胶印模和聚合物弹性印章样品,弹性印章特征线条尺寸在长宽高方向上为70mm×50μm×42μm,完全可满足软光刻技术要求,这为软刻蚀技术的进一步开发打下了良好的基础.

关 键 词:软光刻技术  弹性印章  聚二甲基硅氧烷  SU-8胶印模
文章编号:1672-6030(2008)02-0118-03
收稿时间:2007-08-16
修稿时间:2007-08-16

Process Technology of Polymer Elastomeric Stamp
TANG Hai-lin,DING Yuanping. Process Technology of Polymer Elastomeric Stamp[J]. Nanotechnology and Precision Engineering, 2008, 6(2): 118-120
Authors:TANG Hai-lin  DING Yuanping
Affiliation:(Institute of Electronic Engineering, China Academy of Engineering Physics, Mianyang 621900, China)
Abstract:Processes of SU-8 photoresist mold and polymer elastomeric stamp were researched in order to solve the technology of the key part--elastomeric stamp in the soft-lithography. Steady process parameters were obtained through a number of experiments and measurement, moreover, SU-8 photoresist mold and polymer elastomeric stamp with good surface and well figure were realized. The feature sizes on the stamp are 70 mm ×50 μm× 42μm, which can meet requests of the soft-lithography and establish advantageous basis for further exploring the soft-lithography technology.
Keywords:soft-lithography technology  elastomeric stamp  polydimethylsiloxane(PDMS)  SU-8 photoresist mold
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