首页 | 本学科首页   官方微博 | 高级检索  
     

考虑缺陷形状分布的IC成品率模型
引用本文:王俊平,郝跃. 考虑缺陷形状分布的IC成品率模型[J]. 半导体学报, 2005, 26(5): 1054-1058
作者姓名:王俊平  郝跃
作者单位:西安电子科技大学微电子研究所,西安,710071;西安电子科技大学微电子研究所,西安,710071
基金项目:国家高技术研究发展计划(863计划)
摘    要:实现了基于圆缺陷模型的蒙特卡洛关键面积及成品率估计,模拟了圆缺陷模型估计的成品率误差与缺陷的矩形度之间的关系,提出了更具有一般性的两种集成电路成品率模型,它们分别对应于矩形度相同和不同的缺陷.仿真结果表明该模型为成品率的精确表征提供了新途径.

关 键 词:真实缺陷  形状分布  圆缺陷模型  成品率模型
文章编号:0253-4177(2005)05-1054-05
修稿时间:2004-06-29

Yield Modeling of IC Based on Distribution of Defect Shapes
WANG Junping,Hao Yue. Yield Modeling of IC Based on Distribution of Defect Shapes[J]. Chinese Journal of Semiconductors, 2005, 26(5): 1054-1058
Authors:WANG Junping  Hao Yue
Abstract:Yield prediction models and critical area calcu lation are based on defects modeled as circular disks.But the observation of real defects exhibits a great variety of shapes.For this reason,the yield and the critical area predictions by Monte-Carlo techniques are realized,the relation between estimation error of circular defect and the rectangular degree of the defect is simulated and two more general models are first developed to evaluate the functional yield in integrated circuit,which correspond to the same rectangle degrees and the various rectangle degrees of defects,respectively.The simulation results show that the new models can be used to estimate yield of IC in a more accurate way.
Keywords:real defect  circular defect model  yield modeling  shape distribution
本文献已被 CNKI 维普 万方数据 等数据库收录!
点击此处可从《半导体学报》浏览原始摘要信息
点击此处可从《半导体学报》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号