| i线(365nm)分步投影光刻机曝光系统 |
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| 引用本文： | 李尧.i线(365nm)分步投影光刻机曝光系统[J].电子工业专用设备,2001,30(4):7-11. |
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| 作者姓名： | 李尧 |
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| 作者单位： | 信息产业部电子第四十五研究所, |
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| 摘 要： | 主要介绍了一种结构新颖的光学曝光系统 ,对光路的结构、原理、特点以及关键技术作了详细的论述 ,并给出了光路系统图和照明均匀性的测试结果
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| 关 键 词： | i线曝光系统 照明均匀性 方形柱体蝇眼透镜 掩模光栏 消像差聚光系统 |
| 文章编号： | 1004-4507(2001)04-0007-05 |
Exposure Systems for i-Lineray(365 nm)Stepper |
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| LI Yao.Exposure Systems for i-Lineray(365 nm)Stepper[J].Equipment for Electronic Products Marufacturing,2001,30(4):7-11. |
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| Authors: | LI Yao |
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| Abstract: | This paper primarily introduce a sort of structure of novel optical exposure systerm and detailedly discuss the optical structure, principle, character as well as the pivotal technology of optical systerm, and give the chart of optical systerm and the testing result of illumination uniformity |
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| Keywords: | Exposure systerm of i-line Illumination uniformity Quadrate column fly-eye lens Reticle blind Condensing systerm of aberrational crrection |
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