| 氟气-清洗化学气相沉积反应器腔室的创新方式 |
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| 引用本文： | 陈佳明. 氟气-清洗化学气相沉积反应器腔室的创新方式[J]. 半导体技术, 2004, 29(1): 30-34 |
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| 作者姓名： | 陈佳明 |
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| 作者单位： | BOC爱德华先进科技(股份)公司 |
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| 摘 要： | 对于将氟气应用在化学气相沉积器清洗的应用而言,其安全性、稳定性、纯度和价格,在应用上是一个新的挑战.对一般气相沉积反应器清洗而言,一体化氟气供应策略,对寻求低价取代方案的使用者而言,是最安全和稳定的供应方式.
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| 关 键 词： | 氟气 清洗 化学气相沉积 |
| 文章编号： | 1003-353X(2004)01-0030-05 |
Fluorine - an innovative alternative for CVD chamber clean |
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| Kirel Tang. Fluorine - an innovative alternative for CVD chamber clean[J]. Semiconductor Technology, 2004, 29(1): 30-34 |
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| Authors: | Kirel Tang |
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| Abstract: | The implementation of fluorine generation technology for chemical vapor deposi-tion (CVD) chamber cleaning applications poses significant new challenges with regard to safety,reliability, purity and overall cost of ownership. An integrated fluorine supply strategy has beendemonstrated to be the most effective means of implementing a safe and reliable fluorine supply tousers seeking a low-cost replacement for standard chamber clean chemistries. |
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| Keywords: | fluorine cleaning chemical vapor deposition |
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