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Ni颗粒对SnBi焊点电迁移的抑制作用
引用本文:徐广臣,何洪文,聂京凯,郭福.Ni颗粒对SnBi焊点电迁移的抑制作用[J].电子元件与材料,2008,27(11).
作者姓名:徐广臣  何洪文  聂京凯  郭福
作者单位:北京工业大学,材料科学与工程学院,北京,100024
摘    要:为抑制芯片中微小焊点的电迁移,向共晶SnBi钎料中添加微米级Ni颗粒,并在φ0.5mm铜线接头上形成焊点。结果表明:当电流密度为104A/cm2、通电96h后,阳极附近没有出现富Bi层,即电迁移现象得到抑制。这是由于Ni颗粒与Sn形成了IMC,阻挡了Bi沿Sn基体扩散的快速通道,防止了两相分离,提高了焊点可靠性。

关 键 词:电子技术  电迁移  无铅复合钎料  SnBi  Ni颗粒

Electromigration suppressing effect of Ni particle on SnBi soldering point
XU Guang-chen,HE Hong-wen,NIE Jing-kai,GUO Fu.Electromigration suppressing effect of Ni particle on SnBi soldering point[J].Electronic Components & Materials,2008,27(11).
Authors:XU Guang-chen  HE Hong-wen  NIE Jing-kai  GUO Fu
Affiliation:XU Guang-chen,HE Hong-wen,NIE Jing-kai,GUO Fu (School of Materials Science & Engineering,Beijing University of Technology,Beijing 100024,China)
Abstract:For suppressing electromigration of little soldering points in chips, micro sized Ni particle Bi-enrichment was added to eutectic SnBi solder, and forming soldering point at φ 0.5 mm Cu filament ends. Results show that there is no Bi enrichment ply in the anode, e.g. electromigration is suppressed when current density is 104 A/cm2 after 96 h, because of IMC (Ni and Sn) blocks the fast diffusion paths of Bi along Sn-base, separation of two phases is retarded and the reliability of soldering points increases.
Keywords:SnBi
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