Fluorine diffusion on a polysilicon grain boundary network inrelation to boron penetration from P+ gates |
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Authors: | Hsing-Huang Tseng Orlowski M Tobin PJ Hance RL |
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Affiliation: | Motorola Inc., Austin, TX; |
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Abstract: | The combined effect of boron penetration and fluorine transport from P+ polycrystalline gates on flat-band voltage is studied. The SIMS concentration depth profiles elucidate the effect of annealing temperature on the fluorine transport, which in turn affects the boron penetration induced change in flat-band voltage. The fluorine diffusion in the poly gate is dominated by grain boundary diffusion. The identification of this mechanism is supported by SIMS profiles and a simulation based on a new methodology of network diffusion |
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