Fabrication and evaluation of Nb/Nb5Si3 microlaminate foils

Alloys of Nb and Nb₅Si₃, and in particular Nb/Nb₅Si₃ microlaminates, have potential as high-temperature materials. In this study, microlaminates of Nb and amorphous Nb-37.5 at. pct Si are magnetron sputter deposited from elemental Nb and polycrystalline Nb₅Si₃ targets. The microlaminates are heat treated at high temperatures to produce crystalline layers of Nb and Nb₅Si₃ that are flat, distinct, and stable for at least 3 hours at 1200 °C. The layers consist of textured Nb grains and equiaxed submicron Nb₅Si₃ grains. Initial room-temperature tensile tests indicate that the microlaminates have strengths similar to cast and extruded alloys of Nb and Nb₅Si₃. The fracture mode of the Nb layers is dependent on the Nb layer thickness, with thin layers failing in a ductile manner and thick layers failing by cleavage. The Nb layers bridge periodic cracks in the Nb₅Si₃ layers, and using a shear lag analysis, the tensile strength of Nb₅Si₃ is estimated. The results indicate that microstructurally stable and mechanically robust microlaminates of Nb and Nb₅Si₃ can be fabricated by sputter deposition with a high-temperature heat treatment. The processing, microstructure, and mechanical properties of these microlaminates are discussed.