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MOPA结构准分子激光同步触发设计
引用本文:王晨,梁勖,林颖,方晓东.MOPA结构准分子激光同步触发设计[J].红外与激光工程,2021,50(11):20200516-1-20200516-6.
作者姓名:王晨  梁勖  林颖  方晓东
作者单位:1.中国科学院合肥物质科学研究院 安徽光学精密机械研究所,安徽 合肥 230031
基金项目:中国科学院青促会资助项目(2018481);深圳市科技计划项目(KQTD20170331115422184)
摘    要:介绍了一种MOPA结构的准分子激光全隔离型、高精度的同步触发系统。首先,提出锁相环移相技术结合传统计脉冲的方法实现了系统的高分辨率与大范围;其次,采用全电气隔离的方式实现了系统在复杂的电磁干扰环境下长期稳定运行以及实时控制。系统主要参数达到分辨率1 ns、延时及脉宽调节范围0~325 μs、各通道间的抖动<60 ps、前后沿<1.5 ns。同步触发系统应用于一套193 nm深紫外MOPA结构准分子激光装置,在4 kHz的高重频下实现了对 MOPA 双腔放电延时的精准实时控制,相对放电延时可严格控制在最佳时间段,放电时序抖动<±4 ns,最后成功获得PA腔对MO腔种子光的脉冲能量放大,最大放大率达到19.2,最大输出脉冲能量达到7.1 mJ,满足深紫外光刻应用需求。

关 键 词:同步触发    振荡放大    全隔离    高精度    延时
收稿时间:2020-12-25

Synchronization trigger design of MOPA structure excimer laser
Wang Chen,Liang Xu,Lin Ying,Fang Xiaodong.Synchronization trigger design of MOPA structure excimer laser[J].Infrared and Laser Engineering,2021,50(11):20200516-1-20200516-6.
Authors:Wang Chen  Liang Xu  Lin Ying  Fang Xiaodong
Affiliation:1.Anhui Institute of Optics and Fine Mechanics, Hefei Institute of Physical Science, Chinese Academy of Sciences, Hefei 230031, China2.University of Science and Technology of China, Hefei 230026, China3.Shenzhen ShengFang Tech Co., Ltd., Shenzhen 518000, China
Abstract:A fully isolated, high-precision synchronous trigger system with MOPA structure of excimer laser was introduced. Firstly, the phase-locked loop phase shift technology combined with the traditional pulse counting method was proposed to realize the high resolution and large range of the system; Secondly, the full electrical isolation way was used to achieve long-term stable operation and real-time control of the system in a complex electromagnetic interference environment. The main parameters of the system reached a resolution of 1 ns, a delay and pulse width adjustment range of 0-325 μs, the jitter between each channel was less than 60 ps, and the front and back edges were less than 1.5 ns. Synchronous trigger system applied to a set of 193 nm deep ultraviolet MOPA structure excimer laser device. It realized the precise real-time control of MOPA dual cavity discharge sequence under the high repetition frequency of 4 kHz, the relative discharge delay can be strictly controlled in the best time period, the discharge timing jitter was less than ±4 ns, and the pulse energy amplification of the MO cavity seed light was successfully obtained by the PA cavity. The magnification rate reached 19.2, and the maximum output pulse energy reached 7.1 mJ. It meets the needs of deep ultraviolet lithography applications.
Keywords:
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