Characterization of defects in hydrogenated amorphous silicon devices using charge collection scanning electron microscopy

Electron-beam-induced current (EBIC) and secondary electron image (SEI) modes of a scanning electron microscope (SEM) are utilized for characterization of charge collection inhomogeneities in hydrogenated amorphous silicon devices. These inhomogeneities are due to such fabrication defects as substrate surface roughness, pin holes, blistering and lift-off. SEM observations are correlated with the electrical properties of the devices. Electronirradiation-induced damage in these devices is also investigated by measuring the EBIC time decay at continuous electron irradiation as a function of both the electron -beam energy and current. This decay mechanism is based on the formation of electron-irradiation-induced microscopic defects that act as recombination centers and reduce the lifetime of carriers.