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Simplification of the Plasma Load of Negative-Pulse-Bias Source Used in Arc Ion Plating
Authors:Dong QI  Ninghui WANG  Guoqiang LIN  Zhenfeng DING
Abstract:Based on the voltage and current fluctuating phenomenon in the arc plasma load under the negative-pulse-bias, usingthe plasma physics theory and analysis of computer simulation expatiates that the nature of plasma load in vacuumarc plasma is a capacitance
Keywords:Vacuum arc ion plating
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