基于MC算法的光刻仿真微结构的三维重建

在深度光刻中为了仿真微结构的形状,需要利用三维光场分布的数据对其进行三维重建。而MC(Marching Cubes)算法是三维重建中构造等值面的代表性的方法之一。以MC算法为基础,首先介绍了如何利用MC算法来绘制三维光场数据的等值面,然后分析将等值面和边界所围成的空洞补全的方法,最后研究了如何利用有限元分析软件的参数化设计语言将生成的面模型转换成实体模型。该方法重建的几何模型不但可以用于微结构形状误差分析,而且还可方便的用于建立有限元模型,直接应用于有限元分析。

3D Reconstruction of lithography simulation micro-structure based on MC Algorithm

To simulate the shape of micro-structure in the deep lithography,three-dimensional reconstruction of light field data from theoretical calculation is needed.MC(Marching Cubes) algorithm is one of the most representative methods for constructing iso-surface in three-dimensional reconstruction.Based on MC algorithm,this paper first introduced the use of MC algorithm to draw the iso-surface of three-dimensional field data,and then analyze methods to cap the holes generated by the iso-surface and its boundary. Finally,the parametric design language of finite element analysis software is studied to convert the surface model into solid model. The reconstructed geometric model can not only be used for the shape error analysis of micro-structure,but also facilitate the establishment of the finite element model,which will be directly applied in finite element analysis.