Hot-carrier degradation behavior of thin-film SOI nMOSFET withisolation scheme and buried oxide thickness

Hot-carrier degradation behavior of thin-film SOI (silicon-on-insulator) nMOSFETs with various isolation techniques and buried oxide (BOX) thickness has been investigated focused on the stress behavior in the SOI structure. LOCOS (local oxidation of silicon) and STI (shallow trench isolation) processes are used as isolation techniques. Buried oxide thickness is 100 and 400 nm, respectively. From the isolation point of view, STI-processed SOI devices have better hot-carrier immunity than LOCOS-isolated SOI devices. In terms of BOX thickness, the thick BOX case has better hot-carrier degradation characteristics than the thin one. It is found that STI process and thick BOX cases induce smaller stress than LOCOS process and thin BOX cases, resulting in better hot-carrier immunity