| 在p-Si(100)上溅射法生长ZnO的结构和光学特性 |
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| 引用本文： | 姚振钰,贺洪波,柴春林,刘志凯,杨少延,张建辉,廖梅勇,范正修,秦复光,王占国,林兰英. 在p-Si(100)上溅射法生长ZnO的结构和光学特性[J]. 功能材料与器件学报, 2000, 6(4): 338-341 |
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| 作者姓名： | 姚振钰 贺洪波 柴春林 刘志凯 杨少延 张建辉 廖梅勇 范正修 秦复光 王占国 林兰英 |
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| 作者单位： | 1. 中国科学院半导体研究所半导体材料科学实验室,北京,100083
2. 中国科学院上海光学精密机械研究所薄膜技术中心,上海,201800 |
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| 基金项目： | 863计划资助项目!( 863- 715- 0 0 1- 0 162 ) |
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| 摘 要： | 室温下在ｐ－Ｓｉ（１００）上采用直流反应磁控溅射法外延生长了ＺｎＯ薄膜。ＸＲＤ测量表明了ＺｎＯ是高度ｃ轴单一取向生长的，ＸＲＣ测量则表明了ＺｎＯ的高质量在室温下的ＰＬ测量中见到了带边发射，其强度与晶体质量有关。
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| 关 键 词： | 磁控溅射 ZnO薄膜 Si衬底 光学特性 XRC XRD |
| 修稿时间： | 2000-07-24 |
Structure and optical properties of ZnO film grown on p-type Si(100)substrate by sputtering |
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| YAO Zhen-yu,HE Hong-bo,CHAI Chun-lin,LIU Zhi-kai,YANG Shao-yan,ZHANG Jian-hui,LIAO Mei-yong,FAN Zheng-xiu,QIN Fu-guang,WANG Zhan-guo,LIN Lan-ying. Structure and optical properties of ZnO film grown on p-type Si(100)substrate by sputtering[J]. Journal of Functional Materials and Devices, 2000, 6(4): 338-341 |
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| Authors: | YAO Zhen-yu HE Hong-bo CHAI Chun-lin LIU Zhi-kai YANG Shao-yan ZHANG Jian-hui LIAO Mei-yong FAN Zheng-xiu QIN Fu-guang WANG Zhan-guo LIN Lan-ying |
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| Abstract: | At room temperature ZnO thin films were eptaxially deposited on p Si(100) substrate by DC reactive magnetron sputtering.The XRD patterns of ZnO films showed the sharp diffraction peaks for ZnO(0002), which indicates that the as grown films are highly C axis oriented .The X ray rocking curve(XRC) of ZnO(0002) peak showed that the high quality ZnO was obtained. The band edge emission was observed in the PL spectra at room temperature. Its intensity was related to quality of the crystal. |
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| Keywords: | Magnetron sputtering ZnO thin films Silicon substrate |
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