| 多层膜界面粗糙度的低角X射线衍射研究 |
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| 引用本文： | 王凤平,崔明启,王佩璇,方正知. 多层膜界面粗糙度的低角X射线衍射研究[J]. 金属学报, 1996, 32(7): 774-778 |
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| 作者姓名： | 王凤平 崔明启 王佩璇 方正知 |
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| 作者单位： | 北京科技大学，中国科学院高能物理研究所 |
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| 摘 要： | 对磁控溅射方法制备的Ｗ／Ｓｉ周期多层膜在Ｘ射线衍时仪上进行了低角Ｘ射线衍射实验，并用动力学理论分析了膜层的周期结构和界面粗糙度，在对实验谱线的拟合过程中，考虑了界面的不对称性、周期的随机涨落及系统偏差等因素对衍射强度的影响，并讨论了各个参量对衍射强度影响的程度．
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| 关 键 词： | 多层膜 磁控溅射 低角X射线衍射 粗糙度 |
| 收稿时间： | 1996-07-18 |
| 修稿时间： | 1996-07-18 |
STUDY OF MULTILAYER INTERFACE ROUGHNESS BY LOW-ANGLE X-RAY DIFFRACTION |
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| WANG Fengping,CUI Mingqi,WANG Peixuan,FANG Zhengzhi University,of Science and Technology Beijing,Beijing Institute of High Energy Physics,Chinese Academy of Sciences,Beijing. STUDY OF MULTILAYER INTERFACE ROUGHNESS BY LOW-ANGLE X-RAY DIFFRACTION[J]. Acta Metallurgica Sinica, 1996, 32(7): 774-778 |
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| Authors: | WANG Fengping CUI Mingqi WANG Peixuan FANG Zhengzhi University of Science Technology Beijing Beijing Institute of High Energy Physics Chinese Academy of Sciences Beijing |
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| Abstract: | W/Si multilayer for soft X-ray optics was deposited by magnetron sputtering. The periodicity and interface roughness of the multilayer were studied by low-angle X-ray diffraction at a X-ray diffractometer, and analyzed with dynamical theory of X-ray diffraction. Good fitting between simulational and experimental curve has been obtained with a model that allows for interface asymmetry. |
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| Keywords: | multilayer low-angle X-ray diffraction interface roughness magnetron sputtering |
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