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钽掺杂对多层Ta-DLC薄膜摩擦及腐蚀行为的影响
引用本文:李超,孙刚,马国佳,吴俊升,张博威,张昊泽.钽掺杂对多层Ta-DLC薄膜摩擦及腐蚀行为的影响[J].表面技术,2024,53(8):63-73.
作者姓名:李超  孙刚  马国佳  吴俊升  张博威  张昊泽
作者单位:北京科技大学 新材料技术研究院,北京 100083;中国航发动力股份有限公司,西安 710021;中国航空制造技术研究院a.高能束流加工技术重点实验室b.先进表面工程技术航空重点实验室,北京 100024
基金项目:国家自然科学基金(51771027);北京市自然科学基金(2212037);国家科技基础资源调查专项(2019FY101400)
摘    要:目的 解决316L不锈钢在苛刻海洋环境中易磨损、易腐蚀的问题。方法 采用中频磁控溅射技术在316L不锈钢上沉积了Ta/TaN/TaCN/Ta-DLC薄膜。通过扫描电子显微镜、拉曼光谱、X射线光电子能谱、X射线衍射、纳米压痕、往复摩擦磨损试验和电化学测试等手段,重点研究了DLC膜层中Ta元素掺杂含量对薄膜结构、组成成分、力学性能、摩擦学性能和耐腐蚀性能的影响规律。结果 随着Ta元素含量(原子数分数)从2.04%增到4.16%,薄膜中的sp3键含量呈现先升高后降低的趋势,当Ta原子数分数为3.60%时,薄膜中sp3键含量最高,且薄膜的硬度及弹性模量达到最大,分别为7.01 GPa和157.87 GPa。随着Ta元素含量的增加,薄膜的平均摩擦因数逐渐减小,在4.16%(原子数分数)时达到最小0.21。Ta元素含量对薄膜的结合力影响较小,且所有薄膜结合力总体在10 N左右。当Ta原子数分数为3.60%时,薄膜的腐蚀电流密度及钝化电流密度最小,分别为0.006 μA/cm2和0.63 μA/cm2,比其他薄膜的低1~2个数量级,并且薄膜电阻及电荷转移电阻最大,展现出最为优异的耐腐蚀性能。结论 Ta元素的掺杂提高了薄膜的耐摩擦性能,且适当的Ta元素掺杂能够提高Ta/TaN/TaCN/Ta-DLC薄膜的耐磨耐蚀性能。

关 键 词:DLC薄膜  磁控溅射  腐蚀  摩擦磨损  元素掺杂
收稿时间:2023/5/11 0:00:00
修稿时间:2023/10/3 0:00:00

Effects of Tantalum Doping on Friction and Corrosion Behavior of Multilayer Ta-DLC Films
LI Chao,SUN Gang,MA Guoji,WU Junsheng,ZHANG Bowei,ZHANG Haoze.Effects of Tantalum Doping on Friction and Corrosion Behavior of Multilayer Ta-DLC Films[J].Surface Technology,2024,53(8):63-73.
Authors:LI Chao  SUN Gang  MA Guoji  WU Junsheng  ZHANG Bowei  ZHANG Haoze
Affiliation:Institute of Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China;AECC Aviation Power Co., Ltd., Xi''an 710021, China;a.Science and Technology on Power Beam Processes Laboratory, b.Aeronautical Key Laboratory for Advanced Surface, AVIC Manufacturing Technology Institute, Beijing 100024, China
Abstract:Diamond-like carbon (DLC) films are widely applied in material protection due to high hardness, excellent wear resistance, and corrosion resistance. To solve the problem that 316L stainless steel is prone to wear and corrosion in the environment of marine friction and corrosion, Ta/TaN/TaCN/Ta-DLC films were deposited on 316L stainless steel by mid-frequency magnetron sputtering technology. The surface morphology, cross-sectional morphology, and corrosion morphology of the prepared films were observed by scanning electron microscopy (SEM). Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and X-ray diffractometer (XRD) were used to analyze the electronic structure of carbon element, chemical bond information, and phase composition in DLC films, respectively. The tribological and mechanical properties were tested by scratch method, nanoindentation test, and friction and wear test. The corrosion resistance of the films was tested by the electrochemical method. The effect of Ta element content in DLC film on the structure, composition, mechanical properties, tribological properties and corrosion resistance of the film was studied.
Keywords:DLC film  magnetron sputtering  corrosion  friction and wear  element doping
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