The impact of device scaling and power supply change on CMOS gateperformance |
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Authors: | Kai Chen Wann HC Ko PK Chenming Hu |
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Affiliation: | Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA; |
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Abstract: | Based a new empirical mobility model that is solely dependent on V gs, Vt, and Tox and a corresponding saturation drain current (Idsat) model, the impact of device scaling and power supply voltage change on CMOS inverter's performance is investigated in this paper. It shows that the Tox which maximizes inverter's speed may be thicker than reliability consideration requires. In addition, very high speed can be achieved even at low Vdd (for low power applications) if Vt can be lowered |
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