钛合金双层辉光等离子体渗钽工艺的研究

利用双层辉光等离子渗金属技术，以纯钽作为源极，氩气为工作气体，利用不等电位空心阴极效应，在钛合金表面进行渗钽试验研究。用扫描电子显微镜（SEM）观察分析了钛钽合金渗层的截面形貌。用显微硬度仪测量渗层的显微硬度。结果表明，在Ti6A14V合金基材表面成功形成钛钽合金扩散层约为10μm厚。表面显微硬度值达到530HV。工艺参数对渗钽层的厚度有较大影响，渗钽最佳工艺参数范围为工件电压550～600V，源极电压850～900V，极间距15～40mm，温度800～900℃。

Process of the Double Glow Discharge Tantalizing on Titanium Alloy Surface

The Ti-Ta alloying diffusion layer was fabricated on the surface of titanium alloy （Ti6A14V） by double glow discharge plasma technique. The pure tantalum was selected as the source cathode and Ar as the working gas. The microhardness of the surface of sample was tested by HMV-1T micro-sclerometer. The cross sectional microstructure of the Ti-Ta alloying layer are analyzed by means of scanning electron microscopy （SEM）. The process of the double glow discharge tantalizing on the surface of titanium alloy is also studied in the paper. The results show that it is feasible to prepare an alloying layer. The microhardness of the Ti-Ta alloying layer is as 530.0 HV, which is much larger than that of the Ti6A14V. The process parameters have obvious effects on the thickness of the alloying layer. The optimum parameters of the double glow discharge tantalizing on titanium surface. Cathode voltage is 550～600V, Source voltage is 850～900 V, Distance,of poles is 15～40 mm, Treatment temperature is 800～900℃.