Effects of the annealing heating rate on sputtered aluminum oxide films |
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| Authors: | Xiufeng Tang |
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| Affiliation: | 1.School of Applied Physics and Materials,Wuyi University,Jiangmen,China;2.State Key Laboratory of Solidification Processing, School of Materials Science and Engineering,Northwestern Polytechnical University,Xi’an,China |
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| Abstract: | Al x O y films by DC reactive magnetron sputtering were annealed in air ambient at 500 °C for 1 h with different heating rates of 5, 15, and 25 °C/min.Then heat treatments at 900 °Cwere carried out on these 500 °C-annealed films to simulate the high-temperature application environment. Effects of the annealing heating rate on structure and properties of both 500 °C-annealed and 900 °C-heated films were investigated systematically.It was found that distinct γ-Al2O3 crystallization was observed in the 900 °C-heated films only when the annealing heating rates are 15 and 25 °C/min. The 500 °C-annealed film possessed the most compact surface morphology in the case of 25 °C/min. The highest microhardness of both 500 °C-annealed and 900 °C-heated films were obtained when the annealing heating rate was 15 °C/min. |
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