Computer simulation of the formation of niobium film nanostructure by low-temperature deposition

Computer simulation is explored to study the formation of the niobium film nanostructure by low-temperature deposition. The dependence of dynamical evolution of surface morphology with respect to film thickness is investigated. Calculations of the film density variation at 300 and 800 K are performed. It has been established that the formation of the microcracks elongated along the crystallographic 〈1 0 0〉 direction was the result of surface instabilities during film growth. The internal microstresses arising in the films were evaluated. It has become apparent that the whole complex of phenomena: the porosity formations, the block structure development, the internal microstresses, taking place in the low-temperature deposition, are involved in surface instabilities during niobium film growth.