Substrate temperature dependence of the properties of Ga-doped ZnO films deposited by DC reactive magnetron sputtering |
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Authors: | Quan-Bao Ma Hai-Ping He Jing-Rui Wang Li-Ping Zhu Bing-Hui Zhao |
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Affiliation: | State Key Laboratory of Silicon Materials, Department of Materials, Zhejiang University, Hangzhou 310027, People's Republic of China |
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Abstract: | Ga-doped zinc oxide (ZnO:Ga) transparent conductive films were deposited on glass substrates by DC reactive magnetron sputtering. The influence of substrate temperature on the structural, electrical, and optical properties of ZnO:Ga films was investigated. The X-ray diffraction (XRD) studies show that higher temperature helps to promote Ga substitution more easily. The film deposited at 350 °C has the optimal crystal quality. The morphology of the films is strongly related to the substrate temperature. The film deposited is dense and flat with a columnar structure in the cross-section morphology. The transmittance of the ZnO:Ga thin films is over 90%. The lowest resistivity of the ZnO:Ga film is 4.48×10−4 Ω cm, for a film which was deposited at the substrate temperature of 300 °C. |
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Keywords: | 73 61 &minus r 78 20 &minus e 68 55 Jk 81 15 Cd |
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