Thermal behavior Spice study of 6H-SiC NMOS transistors |
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Authors: | D. Chalabi A. Saidane M. Benzohra |
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Affiliation: | a Laboratoire CaSiCCE, ENSET ORAN BP: 1523, ORAN El Ménaouer, 31000 Oran, Algeria b Université de ROUEN, 76821 Mont Saint Aignan Cedex, France |
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Abstract: | Silicon carbide is a material that is undergoing major advances associated with a broad scope in the field of electronics. The main properties of silicon carbide such as its high thermal conductivity and high band gap make it a material suitable for use in high-temperature and high-power applications. In this Spice study, the thermal behavior of 6H-SiC NMOS transistors is analyzed through their conductance and transconductance changes with temperature in the range −200 to 700 °C. The performances in two basic applications, current mirrors and differential amplifiers, are compared to similar circuits with silicon transistors. The results show that the 6H-SiC NMOS transistors can be used up to 700 °C, while those based on silicon transistors are limited to around 160 °C. |
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Keywords: | Thermal behavior NMOS 6H-SiC Current mirrors Spice simulation Differential amplifiers |
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