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非晶ZrO2-SiO2系薄膜及微细图形的制备
引用本文:赵桂荣,赵高扬.非晶ZrO2-SiO2系薄膜及微细图形的制备[J].材料研究学报,2002,16(2):168-171.
作者姓名:赵桂荣  赵高扬
作者单位:两安理工大学
基金项目:国家自然科学基金,陕西省教育厅资助项目,50072018,99JK169,,
摘    要:采用溶胶-凝胶与化学修饰相结合的方法制备了ZrO2-SiO2系薄膜,研究了这种凝胶薄膜的FT-IR光谱特性及随紫外线照射时的变化,发现在1600-1400cm^-1之间有一些与含锆螯合物相关的峰,这些峰值随紫外线照射而减弱,表明这些螯合物发生分解,伴随着螯合物的分解,薄膜的乙醇中的溶解能力也发生变化,利用这特性,紫外光通过掩膜照射凝胶薄膜,用有机溶剂溶洗后,获得凝胶薄膜的微细图形,再进行热处理,消除薄膜中的有机物就可得到非晶质ZrO2-SiO2系薄膜的微细图形。

关 键 词:溶胶-凝胶法  氧化锆  氧化硅  化学修饰  光吸收  微细图形  非晶薄膜
文章编号:1005-3093(2002)02-0168-04
修稿时间:2001年4月9日

PREPARATION OF AMORPHOUS ZrO2-SiO2 THIN FILMS AND THEIR FINE-PATTERNING
ZHAO Guirong,ZHAO Gaoyang.PREPARATION OF AMORPHOUS ZrO2-SiO2 THIN FILMS AND THEIR FINE-PATTERNING[J].Chinese Journal of Materials Research,2002,16(2):168-171.
Authors:ZHAO Guirong  ZHAO Gaoyang
Abstract:The rZrO2.(100-x)SiO2 gel films obtained from zirconium tetra butoxide chemically modified with benzoylacetone and partly hydrolyzed silicon ethoxide have been studied, and the effects of UV irradiation on the FT-IR spectra and solubility were examined. The absorption peaks in FT-IR spectra ranging from 1600 to 1400 cm-1 correspond to the chelate rings, and they weaken after the UV irradiation. These findings show that the UV irradiation dissociates the chelate rings, at the same time, the solubility was changed in organic solvents as ethanol, and subsequently, the fine-patterning process of amorphous ZrO2-SiO2 thin films were examined on the basis of these data.
Keywords:sol-gel process  ZrO_2-SiO_2 thin films  chemical modification  optical absorption  fine patterning  
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