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BPxN1-x薄膜的制备及磷元素对其光学能隙的影响
引用本文:徐世友,祁英昆,张溪文,韩高荣.BPxN1-x薄膜的制备及磷元素对其光学能隙的影响[J].材料科学与工程学报,2003,21(3):335-338.
作者姓名:徐世友  祁英昆  张溪文  韩高荣
作者单位:硅材料国家重点实验室,浙江大学材料系,浙江,杭州,310027
基金项目:国家自然科学基金,60006003,
摘    要:本文从应用出发,选择光学石英为衬底,采用热丝辅助射频化学气相沉积的方法沉积BPxN1—x薄膜,对样品进行了X射线衍射(XRD)、扫描电子显微镜(SEM)、紫外—可见等测试。XRD、SEM结果显示薄膜多晶态,表面形貌随时间变化,最终为胞状;紫外—可见光光谱结果显示BPxN1—x薄膜的紫外吸收边随沉积时间的加长、PH3流量的增加而向长波长方向移动。因此,该材料的光学能隙可以通过生长工艺适当调整。另外,BPxN1—x薄膜与液晶层能较好匹配等特性更使其适用于紫外空间光调制器。

关 键 词:BPxN1-x薄膜  制备  磷元素  掺杂  紫外液晶光阀  光学能隙  热丝辅助射频化学气相沉积  氮化硼
文章编号:1004-793X(2003)03-0335-04
修稿时间:2002年12月30日

Deposition of BPx N1-x Thin Films and Study on the Influence of Phosphorus for its Bandgap Modulation
XU Shi-you,QI Ying-kun,ZHANG Xi-wen,HAN Gao-rong.Deposition of BPx N1-x Thin Films and Study on the Influence of Phosphorus for its Bandgap Modulation[J].Journal of Materials Science and Engineering,2003,21(3):335-338.
Authors:XU Shi-you  QI Ying-kun  ZHANG Xi-wen  HAN Gao-rong
Abstract:BP-xN 1-x thin films were deposited by hot filament assistant r.f.plasma enhanced chemical vapor technique(HF-PECVD) on quarts glass polished wafer substrates for apllication.The films were studied by X-ray diffraction(XRD),Scanning electron microscopy(SEM) and U-V spectrum.It is found that:(1)these thin films are polycrystals,their morphology changes with time and becomes ball-like at last.(2)optical bandgap of these films become narrow with time and the flux of PH-3 increased.Potential application of BP-xN 1-x thin films for ultraviolet spatial light modulator was suggested.
Keywords:BP-xN    1-x  optical bandgap  P dopant  UV-LCLV
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