| Model Development for Analyzing 2DEG Sheet Charge Density and Threshold Voltage considering Interface DOS for AlInN/GaN MOSHEMT |
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| 作者姓名： | Devashish Pandey T. R. Lenka |
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| 摘 要： |
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Model development for analyzing 2DEG sheet charge density and threshold voltage considering interface DOS for AlInN/GaN MOSHEMT |
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| Devashish Pandey,T. R. Lenka.Model Development for Analyzing 2DEG Sheet Charge Density and Threshold Voltage considering Interface DOS for AlInN/GaN MOSHEMT[J].Chinese Journal of Semiconductors,2014,35(10):104001-4. |
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| Authors: | Devashish Pandey and T R Lenka |
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| Affiliation: | Department of Electronics and Communication Engineering, National Institute of Technology Silchar, Assam, 788010, India;Department of Electronics and Communication Engineering, National Institute of Technology Silchar, Assam, 788010, India |
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| Abstract: | A model predicting the behavior of various parameters, such as 2DEG sheet charge density and threshold voltage, with the variation of barrier thickness and oxide thickness considering interface density of states is presented. The mathematical dependence of these parameters is derived in conjunction with the interface density of states. The dependence of sheet charge density with the barrier thickness and with the oxide thickness is plotted and an insight into the barrier scaling properties of AlInN based MOSHEMTs is presented. The threshold voltage is also plotted with respect to barrier thickness and oxide thickness, which reveals the possibility of the enhancement mode operation of the device at low values of the interface DOS. The results are in good agreement with the fabricated device available in the literature. |
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| Keywords: | DOS AlInN MOSHEMT 2DEG barrier scaling |
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