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无定型CNx超硬薄膜的生长过程研究
引用本文:王继刚,李红,张旭海,李凡,蒋建清.无定型CNx超硬薄膜的生长过程研究[J].材料工程,2007(4):39-42,46.
作者姓名:王继刚  李红  张旭海  李凡  蒋建清
作者单位:东南大学,材料科学与工程学院,南京,210096;东南大学,材料科学与工程学院,南京,210096;东南大学,材料科学与工程学院,南京,210096;东南大学,材料科学与工程学院,南京,210096;东南大学,材料科学与工程学院,南京,210096
摘    要:利用直流磁控溅射方法,在高纯石墨衬底上沉积制备碳氮薄膜.借助于SEM对溅射沉积的碳氮薄膜微观形貌进行观察,并对碳氮薄膜的生长过程进行研究.结果表明:沉积所得的碳氮薄膜为无定型结构,且由大量的团簇所组成.在碳氮薄膜的形成过程中,先是在某些局部位置优先形成突起,继而延伸发展成棒状或纤维状结构,并桥联于相邻的CNx团簇间,伴随着这些桥联结构在径向、轴向的扩展,逐渐演变成新的团簇,并毗连成膜;同时,又不断衍生出新的突起,如此反复,实现了碳氮薄膜的持续增厚或生长.

关 键 词:CNx薄膜  磁控溅射  生长  突起
文章编号:1001-4381(2007)04-0039-04
修稿时间:2006-08-032006-12-13

Study on Growth Process of Amorphous Carbon Nitride Film
WANG Ji-gang,LI Hong,ZHANG Xu-hai,LI Fan,JIANG Jian-qing.Study on Growth Process of Amorphous Carbon Nitride Film[J].Journal of Materials Engineering,2007(4):39-42,46.
Authors:WANG Ji-gang  LI Hong  ZHANG Xu-hai  LI Fan  JIANG Jian-qing
Affiliation:School of Materials Science and Engineering, Southeast University, Nanjing 210096, China
Abstract:Carbide nitride film was deposited on graphite substrate using direct current magnetron sputtering.The micro-morphology of CNx films were investigated by scanning electron microscope(SEM),and the growth process was also discussed.The results showed that the achieved CNx film composed a lots of agglomerates with amorphous structures.During the growth process of carbon nitride film,some protuberances were firstly formed at some local places.After the subsequently growing,the bridging structures between the adjacent protuberances were formed in club-shaped or fiber shapes.With the further growing of the bridging structures in the direction of radial and axial,new agglomerates were formed on the basis of the original films,and new protuberances were also formed on the surfaces of the novel agglomerates.Based on the repeating processes,the continual growing of carbon nitride films was realized.
Keywords:CNx film  magnetron sputtering  growth  protuberance
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