| 接触电阻率测量方法的研究 |
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| 引用本文： | 茅保华 鲍希茂. 接触电阻率测量方法的研究[J]. 固体电子学研究与进展, 1990, 10(3): 294-302 |
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| 作者姓名： | 茅保华 鲍希茂 |
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| 作者单位： | 南京电子器件研究所(茅保华，盛永喜)，南京大学物理系(鲍希茂) |
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| 摘 要： | 对于金属-半导体欧姆接触,本文介绍了两种接触电阻率的测量方法:两直径法和回归分析法,测量结果较准确.对同一样品,用多种方法测显,比较其结果并对各种测量方法进行了评述.
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| 关 键 词： | 金属－半导体 接触电阻率 测量法 |
investigation on Measurement of Specific Contact Resistance |
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| Abstract: | For the metal-semiconductor ohmic contact are, two measuring methods of the specific contact resistance presented, i.e. a dualdiameter approach and a regressive analysis. Both are accurate. The measured results on the same sample by various ways are compared, and the diverse methods are also reviewed. |
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