Characterization of dilute species within CVD‐grown silicon nanowires doped using trimethylboron: protected lift‐out specimen preparation for atom probe tomography

Three‐dimensional quantitative compositional analysis of nanowires is a challenge for standard techniques such as secondary ion mass spectrometry because of specimen size and geometry considerations; however, it is precisely the size and geometry of nanowires that makes them attractive candidates for analysis via atom probe tomography. The resulting boron composition of various trimethylboron vapour–liquid–solid grown silicon nanowires were measured both with time‐of‐flight secondary ion mass spectrometry and pulsed‐laser atom probe tomography. Both characterization techniques yielded similar results for relative composition. Specialized specimen preparation for pulsed‐laser atom probe tomography was utilized and is described in detail whereby individual silicon nanowires are first protected, then lifted out, trimmed, and finally wet etched to remove the protective layer for subsequent three‐dimensional analysis.