| RF反应溅射制备SnO2膜及退火效应影响 |
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| 引用本文： | 马黎君.RF反应溅射制备SnO2膜及退火效应影响[J].北京建筑工程学院学报,2000,16(3):60-65. |
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| 作者姓名： | 马黎君 |
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| 作者单位： | Department of Basic Sciences，Beijing，100044 |
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| 基金项目： | 北京建筑工程学院基础科学基金 |
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| 摘 要： | 采用射频反应溅射技术 ,分别在Si单晶及 70 5 9玻璃基片上沉积SnO2 薄膜。X射线衍射测量结果表明 ,主要结构为非晶态。对样品进行了退火处理 ,发现随着退火温度的升高 ,各衍射变高变锐 ,结晶度提高 ,薄膜逐步过渡到多晶态的结构 ,高于一定的退火温度时薄膜呈现四方金红石结构 ,并具备 (10 1)方向的取向特征。研究了退火条件与薄膜结构的关系 ,初步讨论了薄膜择优取向的机制
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| 关 键 词： | SnO2薄膜 退火 结构 择优取向 |
Annealing Effect And Structure Of SnO_2 thin Films Prepared by RF reactive-sputtering |
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| Ma Lijun.Annealing Effect And Structure Of SnO_2 thin Films Prepared by RF reactive-sputtering[J].Journal of Beijing Institute of Civil Engineering and Architecture,2000,16(3):60-65. |
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| Authors: | Ma Lijun |
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| Abstract: | SnO 2 thin films were prepared by RF reactive-sputtering deposition on 7059 glass and silicon. After the deposition, films were annealed in ambient air. The film structure varies as the annealing condition is changed. Microstructure of films were analyzed with XRD respectively. The effects of annealing condition on the structure were discussed. The mechanism of the preferred orientation was discussed also. |
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| Keywords: | oxidized tin films annealing structure preferred orientation |
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