|
|||||
|
|
| 原子层沉积方法制备低温多层Al2O3/TiO2复合封装薄膜的研究 | |
| 引用本文： | 周忠伟,李民,徐苗,邹建华,王磊,彭俊彪.原子层沉积方法制备低温多层Al2O3/TiO2复合封装薄膜的研究[J].液晶与显示,2016,31(6):532-539. |
| 作者姓名： | 周忠伟 李民 徐苗 邹建华 王磊 彭俊彪 |
| 作者单位： | 1. 华南理工大学 材料科学与工程学院, 广东 广州 510641; 2. 创维液晶器件(深圳)有限公司, 广东 深圳 518108 |
| 基金项目： | 深圳市技术攻关计划(No.JSGG20150331171053333);广州市平板显示行业工程技术研究中心资助项目(No.2060502) |
| 摘 要： | 原子层沉积(ALD)方法可以制备出高质量薄膜,被认为是可应用于柔性有机电致发光器件(OLED)最有发展前景的薄膜封装技术之一。本文采用原子层沉积(ALD)技术,在低温(80℃)下,研究了Al2O3及TiO2薄膜的生长规律,通过钙膜水汽透过率(WVTR)、薄膜接触角测试等手段,研究了不同堆叠结构的多层Al2O3/TiO2复合封装薄膜的水汽阻隔特性,其中5 nm/5 nm×8 dyads(重复堆叠次数)的Al2O3/TiO2叠层结构薄膜的WVTR达到2.1×10-5 g/m2/day。采用优化后的Al2O3/TiO2叠层结构薄膜对OLED器件进行封装,实验发现封装后的OLED器件在高温高湿条件下展现了较好的寿命特性。 |
| 关 键 词： | 有机电致发光器件 薄膜封装 原子层沉积 水汽透过率 |
| 收稿时间： | 2016-01-12 |
Low-temperature multi-layer Al2O3/TiO2 composite encapsulation thin film by atomic layer deposition |
|
| ZHOU Zhong-wei,LI Min,XU Miao,ZOU Jian-hua,WANG Lei,PENG Jun-biao.Low-temperature multi-layer Al2O3/TiO2 composite encapsulation thin film by atomic layer deposition[J].Chinese Journal of Liquid Crystals and Displays,2016,31(6):532-539. | |
| Authors: | ZHOU Zhong-wei LI Min XU Miao ZOU Jian-hua WANG Lei PENG Jun-biao |
| Affiliation: | 1. School of Materials Science and Engineering, South China University of Technology, Guangzhou 510641, China; 2. Skyworth LCD Co. Ltd, Shenzhen 518108, China |
| Abstract: | Atomic layer deposition (ALD) is considered as one of the most promising thin-film encapsulation technologies for flexible organic light-emitting diode (OLED) device because of high-quality films formed. In this work, different laminated structures of Al2O3/TiO2 composite film were prepared at low temperature (80℃) by ALD method. The growth mechanism of Al2O3 and TiO2 film was studied. The water vapor barrier properties of the different stacked structures of composite Al2O3/TiO2 thin film were studied by the calcium film, which were analyzed by water vapor transmission rate (WVTR) test and contact angle measurements. The WVTR of the 5 nm/5 nm×8 dyads Al2O3/TiO2 composite thin film was 2.1×10-5 g/m2/day and the OLED devices encapsulated by this optimized Al2O3/TiO2 structure exhibited better lifetime characteristics in high temperature and high humidity test. |
| Keywords: | organic electroluminescent devices thin film encapsulation atomic layer deposition water vapor transmission rate |
| 点击此处可从《液晶与显示》浏览原始摘要信息 | |
| 点击此处可从《液晶与显示》下载全文 | |