周边配向膜Mura改善研究

在大世代线液晶面板厂,因产品切换便捷、产能高等优势,配向膜材料涂布多采用喷墨印刷方式。但随着高分辨率、无边框等技术升级,喷墨印刷方式面临的挑战也随之增加,产生了很多新的配向膜不良。本文研究了一种周边配向膜Mura,分析原因为阵列基板上的配向膜固化时,在基板周边过孔处出现堆积,造成周边显示区配向膜厚不均匀,导致显示区边缘形成暗线不良。文章从配向膜边界位置、预固化温度、预固化环境气压和配向膜膜厚4个方面进行分析实验,证明了外扩配向膜边界、降低预固化温度、降低预固化环境气压和降低配向膜膜厚,可以有效减轻配向膜在周边过孔处堆积,进而成功解决此不良,获得优异的显示品质。

Improvement of peripheral PI Mura

In large generation LCD factory, Inkjet printing is widely used for PI (Polyimide alignment film) material coating,due to convenient product switching and high capacity. As the technology upgrading, such as high PPI, Borderless etc., the challenges of novel PI Mura occurred in inkjet printing process. We research a kind of peripheral PI Mura in this paper. In Pre-cure process, PI solution was accumulated much near the peripheral via Hole of array glass,leading to larger inhomogeneous film thickness, which caused the edge dark line mura. We research the process conditions of PI pattern position, Pre-cure temperature, Pre-cure air pressure and PI Thickness. The results reveal that extending edge of PI pattern, lowering Pre-cure temperature, reducing the air pressure and thinning the film effectively decrease accumulation near the peripheral via hole, and induce the defect-free and excellent display