一种实用的PECVD腔体检漏工具设计方法

在TFT-LCD行业,PECVD设备主要用于Array TFT基板工艺中的气相沉积;产生的非金属膜层,为金属电路提供保护、开关作用;在PECVD工艺制程中,腔体设计复杂,反应条件苛刻,产生的制程物会造成产品不良,故需要定期进行PM(pre maintenance预防性维护)。本文以PECVD PM作业为背景,针对设备PM耗时长的问题,制定了改善方法,并着重介绍了腔体检漏工具的设计过程。设计制作了一台国产化检漏工具,成功运用于量产。通过测试,检漏工具3min内达到10mT(1mT=0.133Pa),漏率为0.45mT/min,基本符合设备Spec.(标准)要求。

Practical design method of PECVD cavity check-up tool

In TFT-LCD industry, PECVD equipment is mainly used for the vapor deposition in the process of Array TFT to produce non-metal film layer, which protects and switches metal circuit. In PECVD process, cavity design is complex and reaction conditions are harsh, the process will lead to bad products, so we need to do pre-maintenance on a regular basis. On the background of PECVD PM,we improved the method and emphatically introduced the cavity check-up leak tool design process because of the time-consuming of PM. We designed a domestic leak detection tool, and applied it into mass producing successfully. Final test results showed that pressure reached to 10 mT in 3 min and the leakage rate is 0.45 mT/min, which accord with the equipment standard.