TFT-LCD残影不良的研究与改善

影像残留是TFT-LCD,特别是TN型产品常见的不良,对产品良率影响很大。本文从产品设计、工艺参数、工艺管控3个方面对残影进行分析。发现产品设计时Data线两侧段差过大,是导致残影发生的主要原因,通过增加配向膜厚度和摩擦强度值可以有效降低残影,实验得出配向膜膜厚高于110nm,摩擦强度高于5.5N·m时无残影发生。通过控制配向膜工程与摩擦工程间的延迟时间在5h,摩擦工程与对盒工程间的延迟时间在10h,并且严格管控ITO偏移量可以有效减少Panel内部电场,从而降低残影。通过以上措施,对于15.6HD产品,良率提升了10%,为企业高效生产奠定基础。

Research and improvement of TFT-LCD image-retention

Image-retention has always been a problem in the TFT-LCD production process, especially for the TN production, and already had a great influence on the production yield of the products. This article mainly discussed the three aspects which had the influence on the incidence of image-retention including product designs, process parameters and the process control. The results showed that the main reason of image-retention is the oversize of segment difference at both sides of the Data line during product designs. And it was found that image-retention could be reduced by increasing the alignment film thickness and the rubbing torque value. No image-retention occurs when the alignment film thickness and the rubbing torque value are higher than 110 nm and 5.5 N·m, respectively. It can lower the image-retention by controlling the ITO overlay and controlling the PI-Rub delay time in 5 h, Rub-Assy delay time in 10 h to reducing the internal electric field of panel. As for 15.6HD products, the yield increased by 10% through the above measures which might lay the foundation of high-efficient production for enterprises.