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Microplasma illumination enhancement of vertically aligned conducting ultrananocrystalline diamond nanorods
Authors:Kamatchi Jothiramalingam Sankaran  Srinivasu Kunuku  Shiu-Cheng Lou  Joji Kurian  Huang-Chin Chen  Chi-Young Lee  Nyan-Hwa Tai  Keh-Chyang Leou  Chulung Chen  I-Nan Lin
Affiliation:1.Department of Materials Science and Engineering, National Tsing-Hua University, Hsinchu, Taiwan 300, Republic of China;2.Department of Engineering and System Science, National Tsing-Hua University, Hsinchu, Taiwan 300, Republic of China;3.Department of Photonics Engineering, Yuan Ze University, Chung-Li, Taiwan 32003, Republic of China;4.Department of Physics, Tamkang University, Tamsui, Taiwan 251, Republic of China
Abstract:Vertically aligned conducting ultrananocrystalline diamond (UNCD) nanorods are fabricated using the reactive ion etching method incorporated with nanodiamond particles as mask. High electrical conductivity of 275 Ω·cm−1 is obtained for UNCD nanorods. The microplasma cavities using UNCD nanorods as cathode show enhanced plasma illumination characteristics of low threshold field of 0.21 V/μm with plasma current density of 7.06 mA/cm2 at an applied field of 0.35 V/μm. Such superior electrical properties of UNCD nanorods with high aspect ratio potentially make a significant impact on the diamond-based microplasma display technology.
Keywords:Ultrananocrystalline diamond nanorods  Reactive ion etching  Microplasma  Electron field emission properties
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