| 掩模版制作工艺中典型问题探析 |
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| 引用本文： | 叶红,吴会龙.掩模版制作工艺中典型问题探析[J].固体电子学研究与进展,2009,29(4). |
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| 作者姓名： | 叶红 吴会龙 |
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| 作者单位： | 南京电子器件研究所,南京,210016 |
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| 摘 要： | 针对制版工艺中典型质量问题事例,分析了影响光刻掩模版的质量因素,提出了有效的解决方案,对保证掩模版质量、提高掩模版的制作水平具有指导意义。
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| 关 键 词： | 光刻掩模版 工艺流程 检测分析 |
Key Factors Analysis of Photomask Process |
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| YE Hong,WU Huilong.Key Factors Analysis of Photomask Process[J].Research & Progress of Solid State Electronics,2009,29(4). |
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| Authors: | YE Hong WU Huilong |
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| Abstract: | The key factors, which influence the quality of photomask, are discussed. Some examples on quality problem in the photomask process are presented.The method to solve this problem is given. The results show that improving photomask fabrication is very important and essential for the photomask quality. |
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| Keywords: | photomask process detection and analysisEEACC 2500 |
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